LCD / Semi Conductor / Other Electronic Parts
CORPORATE TOP／ PROCESS／ SYSTEM ／ OTHER EQUIPMENT
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This device continuously measures the composition of Nitric Acid, Acetic Acid and Phosphoric Acid in the etching bath with high accuracy, by which it controls the concentration of Free Nitric Acid and Acetic Acid which are effective for the etching process as these concentrations are kept constantly at preset value. By controlling the concentration in this way, the stabilization of the etching process and the enormous saving of the mixed acid is obtained. |
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This device automatically controls the concentration of Nitric Acid and Cerium (IV) in the Chromium etching bath as these concentrations are kept constantly at preset value by measuring the concentration of Free Nitric Acid and Cerium (IV) in the Chromium etching liquid using substitution titration and oxidation & reduction titration method. |
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This device measures the concentration of TMAH which is effective for the reaction and controls as the concentration is kept constantly at preset value. By controlling the concentration, the developing process is stabilized, the chemical consumption is greatly reduced and the life time of the liquid is extended. This device is also usable for the concentration measuring of the effective Na2SiO3, KOH, NaOH, etc. in the development liquid. |
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This device measures the concentration of Free Hydrochloric Acid and Iron in the Iron Chloride type ITO etching liquid and controls the concentration of both chemicals as the both concentrations are automatically kept constantly at preset value. By controlling the concentration, the etching process is stabilized and the life time of the liquid is enormously extended. This device is applicable to the etching liquid of Oxalic Acid type and Aqua-regia type. |
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This is the concentration measuring and controlling device of the organic type stripping liquid (mix of MEA & DMSO, etc.). This device is composed of the concentration measuring part, draining part of the worn out liquid, feeding part of the fresh liquid and the operation panel. The concentration measuring part equips the visible light spectro-photometer and the special detector by which it continuously measures the concentration of dissolved photo-resist and water. |
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This device measures continuously the concentration of Free Nitric Acid, Free Acetic Acid and Free Fluoric Acid including Hexafluorosilicate which is created through the process of etching and controls the concentration of Free Nitric Acid, Free Fluoric Acid and Free Acetic Acid which are effective for the etching reaction as these concentrations are kept constantly at preset value. By this controlling, the stabilization of the etching process and the enormous saving of the etching liquid is obtained. |
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This device measures the concentration of Free Hydrochloric Acid and Aluminum Chloride which is accumulated during the process in the Hydrochloric Acid type etching liquid by means of volume analysis method and control the concentration of Free hydrochloric Acid in the etching bath as the concentration is kept constantly at preset value. By this controlling, the stabilization of the Aluminum etching process and the enormous saving of the etching liquid is obtained. |
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